Surface Optimization of Superconducting Aluminum Resonators for Robust Quantum Device Fabrication

Source: arxiv.org/abs/2601.04082

Simon J. K. Lang, Ignaz Eisele, Alwin Maiwald, Emir Music, Luis Schwarzenbach, Carla Moran-Guizan, Johannes Weber, Daniela Zahn, Thomas Mayer, Rui N. Pereira, Christoph Kutter

arXivarxiv/2601.04082Jan 7, 2026quant-phscore 0

Aluminum (Al) remains the central material for superconducting qubits, and considerable effort has been devoted to optimizing its deposition and patterning for quantum devices. However, post-processing strategies focused on oxide removal of niobium (Nb) and tantalum (Ta) -based resonators using buffered oxide etch (BOE), which can not be used for Al. This challenge becomes particularly relevant for industry-scale fabrication with multi-chip bonding, where delays between sample preparation and cooldown require surface treatments that preserve low dielectric loss during extended exposure to…

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