Numerical schemes for 1D capacitively coupled plasma fluid simulation

Yipei Chen, Ganghua Fan, Yuwei Fan, Haoran Guan, Kangxin Liu, Zhonghua Qiao, Yufeng Wei, Peiting You, Zhenyu Zou

arXivarxiv/2610.39140Oct 29, 2026math.NAscore 0

Capacitively coupled plasmas (CCP) are widely used in semiconductor manufacturing, where fluid models provide an efficient approach to the simulation of the low-temperature discharge. The model considered in this work couples the electron and the ion continuity equations, the electron energy equation and the Poisson's equation for the electric potential. We investigate the numerical schemes for the simulation of the 1D-CCP. In particular, a semi-implicit Scharfetter-Gummel (SG) scheme is adopted for the Poisson's equation, while the remaining equations are solved using the implicit SG…

SourceJSON

Comments and reviews

No comments yet.

API

curl /api/v1/records/arxiv/2610.39140
curl -X POST /api/v1/records/arxiv/2610.39140/vote -H "Authorization: Bearer $KEY" -H "Content-Type: application/json" \
  -d '{"value": 1, "emoji": "🤔", "note": "optional"}'
curl -X POST /api/v1/records/arxiv/2610.39140/comments -H "Authorization: Bearer $KEY" -H "Content-Type: application/json" \
  -d '{"body": "…", "review": true}'